Beschaffung eines Deep Reactive Ion Etching (DRIE) Systems für Silizium-Fluor-Chemie

Status
Vergeben
Angebotsfrist
28.04.2026, 12:00 (Europe/Berlin)
Geschätzter Wert
Nicht angegeben
Lose
1
Erfüllungsregion
Sachsen, Deutschland
Verfahren
Offenes Verfahren
Auftragsart
Lieferleistung
Veröffentlicht
26.03.2026
CPV-Codes
Laborgeräte, optische Geräte und Präzisionsgeräte (außer Gläser) (38000000)
Bekanntmachung
tender24.de
Bekanntmachungsnummer
209081-2026
Verfahrensnummer
6630f51f-7185-484c-a04f-6ef513d8d8d9

Fragenkatalog

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Kurzbeschreibung

Das Helmholtz-Zentrum Dresden-Rossendorf schreibt die Lieferung, Installation und Inbetriebnahme eines DRIE-Ätzsystems für den Reinraum des Ion Beam Centers aus. Das Gerät soll für die Strukturierung von Substraten zur Herstellung magnetischer Nanobauelemente für KI-Anwendungen genutzt werden. Die Lieferung und Inbetriebnahme müssen bis spätestens 1. Juni 2027 erfolgen.

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Leistungsbeschreibung

The equipment to be procured is a Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher. This will provide new capabilities of deep trench (Bosch process) and through-via etching to the IBC cleanroom. The equipment is procured through the MagKI investment programme which will provide advanced substrate structuring capabilites to the cleanroom which will be used in the final production of magnetic nanodevices for next-gen European based Artifical Intelligence. It will also offer near vertical sidewall profile of etched via's in Si, SiC as well as 2D materials, like graphene and MoS2. Beside the fulfilment of the criteria described under 2. Performance quote of this Annex A, the scope of deliveries and services includes and are part of the offer: - delivery at the place of usage according to DPU Dresden (Incoterms 2020) Place of usage: - the machine must be capable of operating in a cleanroom environment (ISO Class 6) with the sample loaded in an ISO class 4 / 5 environment. - the footprint, technical drawings, electrical drawings must be supplied in the documentation - user documentation in English and German - delivery, installation and SAT must be possible until 01 June 2027 - warranty of at least two years - place of performance: Helmholtz-Zentrum Dresden-Rossendorf e. V.; Ion Beam Center, building 711/ room 105; Bautzner Landstraße 400; 01328 Dresden - SAT in the cleanroom at the Ion Beam Center, building 711/ room 105. The main body of the tool will be located in a ISO Class 6 service area, the loadlock and control PC will be located in a ISO Class 4 / ISO Class 5 cleanroom - CE-marking

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Leistungen nach Losen (1)

  • LOT-0000 · Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher

    The equipment to be procured is a Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher. This will provide new capabilities of deep trench (Bosch process) and through-via etching to the IBC cleanroom. The equipment is procured through the MagKI investment programme which will provide advanced substrate structuring capabilites to the cleanroom which will be used in the final production of magnetic nanodevices for next-gen European based Artifical Intelligence. It will also offer near vertical sidewall profile of etched via's in Si, SiC as well as 2D materials, like graphene and MoS2. Beside the fulfilment of the criteria described under 2. Performance quote of this Annex A, the scope of deliveries and services includes and are part of the offer: - delivery at the place of usage according to DPU Dresden (Incoterms 2020) Place of usage: - the machine must be capable of operating in a cleanroom environment (ISO Class 6) with the sample loaded in an ISO class 4 / 5 environment. - the footprint, technical drawings, electrical drawings must be supplied in the documentation - user documentation in English and German - delivery, installation and SAT must be possible until 01 June 2027 - warranty of at least two years - place of performance: Helmholtz-Zentrum Dresden-Rossendorf e. V.; Ion Beam Center, building 711/ room 105; Bautzner Landstraße 400; 01328 Dresden - SAT in the cleanroom at the Ion Beam Center, building 711/ room 105. The main body of the tool will be located in a ISO Class 6 service area, the loadlock and control PC will be located in a ISO Class 4 / ISO Class 5 cleanroom - CE-marking

    Frist: 28.04.2026, 02:00 (Europe/Berlin)

Anforderungen an deinen Betrieb

The statutory exclusion requirements pursuant to Sections 123 to 126 of the German Act Against Restraints of Competition (GWB), the 5th EU sanctions package (RUS sanctions), and the grant notice for the magKI project apply. To this end, the self-declarations 'Non existence reasons for exclusion’ and 'RUS sanctions’ attached to the tender documents, as well as the 'Declaration on the beneficial owner’ must be completed and submitted as part of the tender. in accordance with legal requirements from VgV

Wie wird das Angebot bewertet?

LOT-0000 · Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher

Criteria in accordance with Annex 01A Performance Specification and Price Declaration_EUOV2601.xlsx
50 %
Evaluation price according to Annex 01A
50 %

Vergabeunterlagen

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Anforderungen

The statutory exclusion requirements pursuant to Sections 123 to 126 of the German Act Against Restraints of Competition (GWB), the 5th EU sanctions package (RUS sanctions), and the grant notice for the magKI project apply. To this end, the self-declarations 'Non existence reasons for exclusion’ and 'RUS sanctions’ attached to the tender documents, as well as the 'Declaration on the beneficial owner’ must be completed and submitted as part of the tender. in accordance with legal requirements from VgV

Änderungen und Bieterfragen

1 Eintrag
  1. 11.06.2026VergabebekanntmachungBekanntmachung 399787-2026

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